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Optical Materials for UV and Visible Light Lithographies

Fused silica, Si02 9.0 Stepper optics, mask blanks [Pg.649]

Calcium fluoride, Cap2 10.3 Laser optics, stepper optics [Pg.649]

Barium fluoride, Bap2 9.2 Crystal growth issues  [Pg.649]

Magnesium fluoride, MgF2 11 Birefringent Laser optics, antireflection coatings [Pg.649]

Sapphire, AI2O3 8.3 Birefringent, absorbs at 193 nm because of impurities  [Pg.649]

See other pages where Optical Materials for UV and Visible Light Lithographies is mentioned: [Pg.648]   


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Optical lithography

Optical material

Optics UV-visible

UV light

UV lithography

UV- and visible light

Visible light

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