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Near-field nanolithography

Yin, X., N. Fang, X. Zhang, I.B. Martini, and B.J. Schwartz. 2002. Near-field two-photon nanolithography using an apertureless optical probe. Appl. Phys. Lett. 81 3663-3665. [Pg.179]

The enhanced near-field of plasmon resonant metal nanoparticles has also been employed to induce local photolithography [27]. Due to the strongly confined nature of the near-field, sub-diffraction resolution is achievable. Plasmon enhanced nanolithography will be discussed in a later section. There have also been proposals on plasmon field-enhanced photochemistry and photocatalysis. [Pg.266]

See other pages where Near-field nanolithography is mentioned: [Pg.120]    [Pg.171]    [Pg.120]    [Pg.171]    [Pg.188]    [Pg.179]    [Pg.179]    [Pg.168]    [Pg.176]    [Pg.3608]    [Pg.3629]    [Pg.460]    [Pg.149]    [Pg.137]    [Pg.137]   
See also in sourсe #XX -- [ Pg.171 ]



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