Naphthoquinone, 2,3-diazido

Another precursor to the azaquinone (135), 2-azido-2-cyano-l,3-indandione (134), was isolated in 18% yield when 2,3-diazido-1,4-naphthoquinone was decomposed in chlorobenzene at 95-100°C. Under these conditions, a 61% yield of o-phthaloyl cyanide was also realized, and no azaquinone was detected. Subsequent thermolysis of (134) in refluxing o-dichlorobenzene gave the azaquinone (135) in 75% isolated yield. 

Other examples are the fissions of 2,3-diaizido-l,4-naphthoquinone to phthaloyl cyanide (80) and of 2,3-diazido-A -phenylmaleimide to... 

The diazido-ort/io-naphthoquinone/novolac (DNQ/ novolac) photoresists have been the workhorse for the semiconductor industry for over 30 years and still continue to be the most widely used photoresists today. ° They may be utilized with different exposure wavelength technologies I-line (365 nm), G-line (436 nm), and even 248 nm. Although productivity requirements for the technology with 248 nm exposure have demanded the transfer to photoresists with a chemical amplification, the DNQ-novolac resists still remain to be the most widely used and constantly finding new areas of implementation. The modern state-of-the-art in the microdevices technology gives an opportunity to use the DNQ-novolac resists to print features as small as 0.25 In addition, these photoresists in the form... 

NMP and admixed with the poly(amic acid). The photosensitive compound is added to this mixture. The compound generates an acid by irradiation with light. These compounds are also addressed as photo acid generators. A photosensitive compound is prepared by the condensation of 4,4c [ 1 - [4- [ 1 -(4-hydroxyphenyl)-1 -methylethyl]phenyl] ethyhdene] with l,2-naphthoquinone-2-diazido-5-sulfonyl chloride. Other types of photo acid generators are summarized in Table 15.10. 

---