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Nanoparticle Dispersibility in CXLs

The van der Waals attractive potential [27] increases with an increase in nanopartide radius or with a decrease in center-to-center separation distance between nanoparticles  [Pg.48]

Two repulsive contributions, osmotic and elastic contributions [31, 32], oppose the van der Waals attractive contribution where the osmotic potential depends on the free energy of the solvent-ligand interactions (due to the solvation of the ligand tails by the solvent) and the elastic potential results from the entropic loss due to the compression of ligand tails between two metal cores. These repulsive contributions depend largely on the ligand length, solvent parameters, nanopartide radius, and center-to-center distance  [Pg.48]


See other pages where Nanoparticle Dispersibility in CXLs is mentioned: [Pg.47]    [Pg.47]    [Pg.49]   


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