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Multi-electron Photoprocesses

This leads us to another important category of multi-electron photoprocesses involving the semiconductor itself. While photocorrosion is a nuisance from a device operation perspective, it is an important component of a device fabrication sequence in the microelectronics industry. Two types of wet etching of semiconductors can be envisioned [290]. Both occur at open-circuit but one involves the action of chemical agents that cause the simultaneous rupture and formation of bonds. This is exemplified by the action of H2O2 on GaAs [291] ... [Pg.2699]

A) minority carrier transfer catalysis and/or surface state passivation (B) electrostatic modification (C) catalysis of multi-electron photoprocesses (refer to text). [Pg.2710]


See other pages where Multi-electron Photoprocesses is mentioned: [Pg.2695]    [Pg.2696]    [Pg.2698]    [Pg.2695]    [Pg.2696]    [Pg.2698]   


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Electron multi

Photoprocesses

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