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Metalloorganic chemical vapor deposition

Various techniques of thin film deposition, including CVD (also abbreviated as MOCVD, metalloorganic chemical-vapor deposition) have been under intensive development for the. r-block elements, and particularly the alkaline earth metals, since the late 1980s. - The lability of the Cp rings of 49 has also made it a useful source of the... [Pg.96]

Metallomesogens (continued) examples, 12, 273 imine complexes, 12, 254 pyrimidine complexes, 12, 270 overview, 12, 195-293 via palladacycles, 8, 288 thermotropic liquid crystals, 12, 197 Metalloorganic chemical-vapor deposition, for semiconductor growth, 12, 8... [Pg.143]

Metal pair sites on supports, 63-64 Metalloorganic chemical vapor deposition, nanowires, 179 Metals... [Pg.209]

Metalloorganic Chemical Vapor Deposition (MOCVD) Technique... [Pg.240]

MOCVD Metal-organic chemical vapor deposition or Metalloorganic chemical vapor deposition... [Pg.430]

See other pages where Metalloorganic chemical vapor deposition is mentioned: [Pg.165]    [Pg.61]    [Pg.146]    [Pg.2709]    [Pg.61]    [Pg.165]    [Pg.61]    [Pg.146]    [Pg.2709]    [Pg.61]    [Pg.2246]    [Pg.2246]   


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