Mechanism of lithographic mask chrome structure oxidation

1 Mechanism of lithographic mask chrome structure oxidation 

The chromium oxide footing seen between the line chrome structures and Si02 surface on gate masks and on the Si02 surface at the bottom of vias with chromium sidewalls (see Fig. 13.16) are Cr Oj. scale growths arising from the oxidation of the Cr and Cr N sidewall of these features. The whole process is perhaps initiated in a 

Tchicioulaeva, A. Holfeld, M. Arend, and E. Foca, ACLV degradation root cause analysis and effective monitoring strategy, Proc. SPIE 7028, 702816 (2008). ibid. 

Swertka, A Guide to the Elements, 2nd ed., pp. 85 86, Oxford University Press, Oxford (2002). i ibid. 

The relevant elementary reactions occurring at each location on each film surface interface are outhned as follows  

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