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Pattern lithographic, production

The x-ray mask represents perhaps the most difficult component to fabricate in the x-ray lithographic system. Watts and Maldonado (77) have outlined the requirements for a mask capable of replicating VLSI patterns in a production environment as follows ... [Pg.78]

Near-field phase shift lithography is a soft lithographic technique used to produce geometric shapes with size features at the nanoscale (approximately 40-80nm).This involves the production of a polymer mask containing the desired pattern to be... [Pg.1300]

See other pages where Pattern lithographic, production is mentioned: [Pg.41]    [Pg.122]    [Pg.38]    [Pg.93]    [Pg.32]    [Pg.38]    [Pg.199]    [Pg.15]    [Pg.1808]    [Pg.12]    [Pg.34]    [Pg.1123]    [Pg.47]    [Pg.194]    [Pg.69]    [Pg.360]    [Pg.31]    [Pg.377]    [Pg.521]    [Pg.550]    [Pg.530]    [Pg.562]    [Pg.1202]    [Pg.430]    [Pg.371]    [Pg.244]    [Pg.427]    [Pg.43]    [Pg.230]    [Pg.419]    [Pg.195]    [Pg.126]    [Pg.170]    [Pg.111]    [Pg.8]    [Pg.371]    [Pg.211]    [Pg.96]    [Pg.342]    [Pg.343]    [Pg.772]    [Pg.194]    [Pg.354]    [Pg.7]    [Pg.105]    [Pg.563]    [Pg.846]    [Pg.608]   
See also in sourсe #XX -- [ Pg.5 ]



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Lithographic

Lithographic patterning

Lithographic patterns

Lithographs

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