Laser-annealed amorphous silicon

Loreti etal. [199] used excimer laser to anneal amorphous silicon seed layers deposited on a metallic Ti/Pd/Ag multilayer (Figure 4.29). 

Sera K, Okumura F, Uchida H, Itoh S, Kaneko S, Hotta K (1989) High-performance TFT s fabricated by XeCl excimer laser annealing of hydrogenated amorphous-silicon film. IEEE Trans Electron Device 36 2868-2872... 

Laser treatment (glazing, annealing, crystal structure modification) A method of rapidly heating and cooling a surface in order to density it, refine the grain size, crystallize an amorphous material, etc. Example Laser treatment of an amorphous silicon film to convert it into a polysilicon material. 

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