Image pattern transfer technique

Figure 17.18 Cross-sectional SEM image of 32-nm half-pitch lines patterned with LFLE double-patterning technique, (a) Line profiles of the two resist layers following the second lithographic exposure, (b) Line profiles after the final pattern transfer to underlying substrate. (Courtesy of S. Holmes.)...

Figure 6 Magnetization transfer technique. (A) Two-pool model used for the evaluation. This is certainly a simplification of reality, although imaging data quality does not justify further elaboration. (B) MTC imaging sequence. A gradient-recalled echo data acquisition is used once more. The spoiler shown is used to dephase residual transverse magnetization after the end of the off-resonance irradiation period (of length t). Practical sequences of all types use pulses like this to eliminate the unwanted signals from spins pursuing complex patterns of excitation and recovery.

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