Hydride termination of germanium

Hydride surface termination has the capability for ideal surface passivation, with each hydrogen atom bonding to a single surface-dangling bond. On silicon, hydride termination has been well researched and shown to provide many advantages, including aqueous stability and limited air stability [13]. The hydride-terminated surface is also of interest as it can be used as a precursor for wet chemical reactions. 

Despite the range of hydrides present, hydride termination by HF etching stabilizes the surface against oxidation and maintains surface ordering for further wet chemistry. Hydride-terminated germanium shows no oxidation after exposure to ambient 

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