High-temperature plasmas advantages over conventional

Plasma-enhanced chemical vapour deposition has gained importance rapidly in recent years, because this technique provides some unique advantages over conventional CVD. The important advantages include lower deposition temperatures, deposition of non-epuilibrium phases and a better control of stoichiometry and purity of deposits. In this technique, the activation energy for the breakdown of reactive species, and their subsequent interaction with other species to form a deposit, is provided by the high kinetic energy of electrons in the plasma (figure 13.2). 

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