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Growth of GaN on Porous TiN

High temperature nucleation of GaN on TiN is effectively suppressed because the Ga has a much higher sticking coefficient (near unity) [25] [Pg.142]

From the discussion above, we note that the coalescence of GaN surface on porous TiN can be difficult because the (1101) facets of GaN [Pg.144]

The density of effective GaN nucleation islands increases with decreasing growth pressure. As will be shown later, although a lower GaN nucleation pressure generates dense GaN nucleation islands, the efficacy of TD reduction by porous TiN is not degraded. [Pg.146]


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