General Considerations on the Photoinitiated Cationic Polymerization Employed in Negative Resist Systems

8 General Considerations on the Photoinitiated Cationic Polymerization Employed in Negative Resist Systems 

Over the years, a number of compounds have been identified to photoinitiate cationic polymerization of monomers designed for radiation curing applications generally, and negative-resist applications specifically. The most prominent of these initiators are onium salts. 

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