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Forrester-Hepburn mechanism

In contrast to this, it has been concluded that the formation of spin adducts on ultraviolet irradiation or mild oxidation of indole nitrones, in the presence of a N -heleroaromatic base, proceeds according to the Forrester-Hepburn mechanism (522). [Pg.219]

Under similar reaction, the action of XeF2 on PBN and DMPO led to similar spin adducts, proving the radical cation mechanism (524). Unlike this reaction, the formation of fluoro-containing spin adducts when using a weaker oxidant such as /V-lluorodibenzsulfonamide [(PhSC>2)2N-F] is believed to involve the Forrester-Hepburn mechanism (524). [Pg.220]


See other pages where Forrester-Hepburn mechanism is mentioned: [Pg.164]    [Pg.450]    [Pg.164]    [Pg.450]    [Pg.130]    [Pg.130]   
See also in sourсe #XX -- [ Pg.164 ]

See also in sourсe #XX -- [ Pg.142 ]

See also in sourсe #XX -- [ Pg.142 ]

See also in sourсe #XX -- [ Pg.142 ]

See also in sourсe #XX -- [ Pg.164 ]

See also in sourсe #XX -- [ Pg.97 , Pg.98 , Pg.142 , Pg.164 ]




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