Fluoropolymers for 157 nm Lithography

The microelectronics industry is interested in maintaining photolithography as the primary manufacturing technology and attempting to migrate to an even 

Fluoropolymers for 157 nm lithography can be categorized into two groups 1) polymers containing F in the backbone, typically prepared by copolymerization involving tetrafluoroethylene (TFE) and 2) polymers containing F in the side chain (Fig. 83). NBHFA has been copolymerized with NBTBE,NBHFA 

Partially esterified hydrofluorocarbon 28% fluorinated 2.60 Poly(P-pinene) 7.15 

Fully esterified hydrofluorocarbon 31% fluorinated 4.56 Acrylic terpolymer (PTBMA-MMA-MAA) 8.20 

Poly(methyl methacrylate) 5.69 Poly(acrylic acid) 11.00 

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