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Electron cross-linked methacrylate

A Sensitive Positive-Working Cross-Linked Methacrylate Electron Resist... [Pg.3]

Figure 3. Cracks in thick cross-linked methacrylate resist films cured at 100°C for 1 h, exposed at 7 ixC/crn at 10 kV and developed for 5 min in methyl isobutyl ketone. Key a, optical micrograph and b, scanning electron micrograph (viewed... Figure 3. Cracks in thick cross-linked methacrylate resist films cured at 100°C for 1 h, exposed at 7 ixC/crn at 10 kV and developed for 5 min in methyl isobutyl ketone. Key a, optical micrograph and b, scanning electron micrograph (viewed...
Poly(glycidyl methacrylate) (PGMA), a well-known negative electron beam resist first reported by Hirai et al. (55), actually functions as a positive-tone resist upon DUV exposure (Table 3.1) (56). The epoxide functionality responsible for cross-linking under electron beam exposure does not absorb in the DUV region, and the response of PGMA to DUV radiation is determined by the absorption due to the n — tt transition of the carbonyl chromo-... [Pg.134]

See other pages where Electron cross-linked methacrylate is mentioned: [Pg.352]    [Pg.87]    [Pg.430]    [Pg.437]    [Pg.190]    [Pg.396]    [Pg.866]    [Pg.140]    [Pg.3]    [Pg.3]    [Pg.4]    [Pg.109]    [Pg.164]    [Pg.77]    [Pg.315]    [Pg.423]    [Pg.112]    [Pg.352]    [Pg.190]    [Pg.396]    [Pg.255]    [Pg.168]    [Pg.437]    [Pg.382]    [Pg.7]    [Pg.305]    [Pg.259]    [Pg.352]    [Pg.284]    [Pg.436]    [Pg.460]    [Pg.224]    [Pg.226]    [Pg.109]    [Pg.164]    [Pg.501]    [Pg.305]    [Pg.326]    [Pg.542]    [Pg.87]    [Pg.463]    [Pg.2]    [Pg.434]    [Pg.609]    [Pg.141]    [Pg.179]    [Pg.1283]    [Pg.278]   
See also in sourсe #XX -- [ Pg.2 , Pg.3 , Pg.4 , Pg.5 , Pg.6 , Pg.7 , Pg.8 , Pg.9 , Pg.10 , Pg.11 , Pg.12 , Pg.13 , Pg.14 , Pg.15 ]



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