Diffusion-limited oxygen sensor structures

Non-Diffusion-Limited Sensor Structures. In this section, we will discuss a number of devices which do not require for their operation the existence of a barrier to the diffusion of oxygen. 

One device of this type was discussed by Hickam and Witkowski(23). In the diffusion limited devices that have been discussed, the flow rate of the gas is not normally an important factor. In the Hickam device, however, the gas flow is of paramount importance and new possibilities or complications arise. The structure consists of pump (upstream) and sensor (downstream) cells cylindrically surrounding a flowing stream of gas containing oxygen. The sensor cell EMF is fedback to the pump so that oxygen is either added to or subtracted from the stream in the amount required to keep the sensor EMF at a constant value. For a calibrated device, the amount of pump current required measures the oxygen content of the gas at the inlet of the structure provided the flow rate is held constant. Alternately, if a gas of constant composition were employed, the structure could be used to measure flow rate. 

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