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Depression identification methods

Although a more complicated nonlinear least squares procedure has been described by Tsai and Whitmore [1982] which allows analysis of two arcs with some overlap, approximate analysis of two or more arcs without much overlap does not require this approach and CNLS fitting is more appropriate for one or more arcs with or without appreciable overlap when accurate results are needed. In this section we have discussed some simple methods of obtaining approximate estimates of some equivalent circuit parameters, particularly those related to the common symmetrical depressed arc, the ZARC. An important aspect of material-electrode characterization is the identification of derived parameters with specific physicochemical processes in the system. This matter is discussed in detail in Sections 2.2 and 3.3 and will not be repeated here. Until such identification has been made, however, one cannot relate the parameter estimates, such as Rr, Cr, and y/zc, to specific microscopic quantities of interest such as mobilities, reaction rates, and activation energies. It is this final step, however, yielding estimates of parameters immediately involved in the elemental processes occurring in the electrode-material system, which is the heart of characterization and an important part of IS. [Pg.20]


See other pages where Depression identification methods is mentioned: [Pg.274]    [Pg.670]    [Pg.112]    [Pg.114]    [Pg.1229]    [Pg.291]    [Pg.27]    [Pg.551]    [Pg.503]    [Pg.40]   
See also in sourсe #XX -- [ Pg.262 ]




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Identification method

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