Deposition from different sources, typical

Almost linear OVPD calibration curves of the typical dopant rubrene for a variety of source flows up to 10 seem and up to 50 seem are presented in Fig. 9.9, which shows that the deposition rate can be precisely adjusted from 0.06 to 1.6 A s-1. Both curves are an ideal fit and reveal a linear relationship between deposition rate and source flow they were collected with two mass-flow controllers of different capacity ranges (10 seem and 50 seem). Ellipsometric thickness analysis confirmed for both experiments a deposition rate of 0.3564 and 0.3582 A s-1, which is a relative error of only 0.48% and is identical with our prediction of dopant controllability (Table 9.1). Using a standard OVPD deposition rate of 10 A s-1 for a hosts the doping range of rubrene can be very precisely adjusted in the range of 0-16%. 

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