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Continuous Chemical Vapour Deposition Process

A few compounds have been studied for other reasons. These include trimethylaluminium [64] and trimethylgallium [65] which are of interest because of their use in metal organic chemical vapour deposition (MOCVD) processes. The compounds were also studied because the interactions between methyl groups in the same molecule are a continuing source of fascination. Tetramethyltin was studied for the same reason [66]. [Pg.385]

T. Bashir, M. Skrifvars, N.-K. Persson, Production of highly conductive textile viscose yams by chemical vapour deposition technique a route to continuous process, Polym. Adv. Technol. 22 (2011) 2214-2221. [Pg.692]

See other pages where Continuous Chemical Vapour Deposition Process is mentioned: [Pg.111]    [Pg.111]    [Pg.111]    [Pg.111]    [Pg.78]    [Pg.327]    [Pg.221]    [Pg.204]    [Pg.37]    [Pg.176]    [Pg.5]    [Pg.68]    [Pg.672]    [Pg.341]    [Pg.251]    [Pg.350]    [Pg.492]    [Pg.144]    [Pg.160]    [Pg.941]    [Pg.90]    [Pg.7]   


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Chemical Continuous

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Continuous processing

Deposition process

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