Cobalt-disilicide

The cohesive, elastic, and dynamic properties of cobalt-disilicide... 

Cobalt disilicide is deposited from the carbonyl Co2(CO)g at 200°C in vacuum, followed by annealing at 700°C... 

The silicide and salicide technologies are particularly important in Japan and may indicate a general switch to these materials whenever appropriate.In one case, epitaxial cobalt disilicide provided a satisfactory diffusion source and is mentioned as a promising alternative for deep submicron devices.1 1... 

T. Barge, S. Poize, J. Bemardini, P. Gas. Cobalt lattice diffusion in bulk cobalt disilicide // Appl.Surface Sci.-1991.-V.53 -P.180-185. 

Cobalt Disilicide, CoSi2, results when cobalt is heated in the electric furnace with excess of silicon or with a mixture of copper silicide and silicon.8 It forms dark crystals, probably belonging to the cubic system density 5 3 hardness 4-5. Sulphur has no action on it, and oxygen at 1200° C. only effects a superficial oxidation. It incandesces in fluorine if gently wanned chlorine attacks it at 300° C., and bromine and iodine at dull red heat. Concentrated hydrogen... 

The lattice diffusion of B implanted into cobalt disilicide was studied. The bulk substrate, prepared by solidification from a melt, had grain sizes in the mm range. The B was introduced by ion implantation. After heat treatment at 450 to 700C, the boron distribution was monitored using secondary ion mass spectrometry. The lattice diffusion was described by ... 

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