Chromium/silica catalyst modifications

When controlled nitridation of surface layers is required, as for example in the modification of the chemical properties of the surface of a support, the atomic layer deposition (ALD) technique can be applied." This technique is based upon repeated separate saturating reactions of at least two different reactants with the surface, which leads to the controlled build-up of thin films via reaction of the second component with the chemisorbed residues of the first reactant. Aluminium nitride surfaces have been prepared on both alumina and silica supports by this method wherein reaction cycles of trimethylaluminium and ammonia have been performed with the respective supports, retaining their high surface areas." This method has been applied to the modification of the support composition for chromium catalysts supported on alumina." ... 

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