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STl CMP performance depends on several factors such as deposited nitride thickness, trench depth, thickness and type of deposited trench-fill oxide, removal rate consistency fhe physicochemical nature of Ce02 particles. [Pg.45]

1 Electrokinehc Behavior of the Ceria Particle, Oxide, and Nitride Films [Pg.46]

See other pages where Chemical Engineering for High Selectivity in STI CMP is mentioned: [Pg.45]