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Chemical Amplification of Photopolymers

Onium salts are decomposed by UV irradiation to produce acids. t-BCXZ (butoxycarbonyl) polyhydroxystyrene (t-BOCPHS) is decomposed by acid. t-BOCPHS added to oniiun salt is decomposed by acid produced from UV irradiation of the onium salt. Since acid is also produced by the photodecomposition reaction, heating the resist after irradiation (postbaking) gives further decomposition. Ito and Wilson reported a photochemical reaction, shown in [Pg.61]

Contamination by airborne basic substances such as amines and N-methylpyrrolidone (NMP) has been shown to be responsible for the formation of the surface insoluble layer. Because of the catalytic nature of the imaging chemistries, a trace amount on the order of 10 ppb of airborne basic substances absorbed in the resist film interfaces with desired acid-catalyzed reactions, and also certain polymers and groups can function as internal contamination. Activated carbon filtration of the enclosing atmosphere can alleviate the contamination problem. Application of a protective [Pg.63]

Pattern profiles of chemical amplification resists. T-top images appear strongly for the longer interval 1. [Pg.63]

The sensitivity of the chemical amplification resist is improved by PEB. However, the resolution power of the resist is decreased by PEB because of the diffusion of acids in the film during baking. The diffusion length of acid is reported to be 25 nm during 95°C PEB for 100 s after exposure. - Addition of an organic base such as triphenylamine and benzamide improved resolution of the CA resist to less than 0.1 pm.  [Pg.65]


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