Carbosilanes photochlorination

Photochlorination leads to attack of CH groups in the carbosilane and, under carefully controlled conditions, it is possible to restrict radical attack to this group. Degradation of the Si—C—Si structure is thus largely avoided (48, 49, 50, 70). As in the case of the alkyl monosilanes, chlorination proceeds as far as steric considerations will allow. Intermediate chlorinated products can be isolated only in a few cases. Thus the following reactions are observed ... 

The formation of C-chlorinated SiF-containing cyclic carbosilanes is possible through reversal of the reaction pathway, namely, via photochlorination of the corresponding SiF-, CH-containing compounds (see Table 36) [89]. 

The photochlorination of SiF- and CH-contahring carbosilanes to fofm (F3Si—CCl2)2SiF2, for example, is not a favorable reaction, because at temperatures as low as 60 °C, cleavage reactions occur. 

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