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Atomic force microscopy film patterns

The data obtained permitted us to propose the model of atomic arrangement of the film structure, which is similar to that published before [2]. The structure shown in Figure 11.1(g) is multi-layered with each layer consisting of carbon atom chains in the sp -hybridization state. These chains are densely packed into a hexagonal lattice. According to the diffraction pattern and atomic force microscopy (AFM) images the distance between the chains is in the range of 0.490 to 0.503 nm. [Pg.223]

Fig. 7 Typical tapping mode atomic force microscopy phase images from a thin diblock copolymer film PBh-PEO(3.7-1.1) showing the evolution of the pattern during annealing at 180 °C. Annealing time for A and B 5 min, C 30min, and D 120 min. The insets gives the corresponding Fourier transforms. The size of the images B, C and D is 1 x 1 p.m. Image (A) is a zoom-in on (B) with the size of 300 x 300 nm ... Fig. 7 Typical tapping mode atomic force microscopy phase images from a thin diblock copolymer film PBh-PEO(3.7-1.1) showing the evolution of the pattern during annealing at 180 °C. Annealing time for A and B 5 min, C 30min, and D 120 min. The insets gives the corresponding Fourier transforms. The size of the images B, C and D is 1 x 1 p.m. Image (A) is a zoom-in on (B) with the size of 300 x 300 nm ...
Fig. 2 Atomic force microscopy (AFM) friction images and schematic illustrations of the patterning processes of a microcontact printed SAMs (mercaptoethanol dots in oc-tadecanethiol matrix, scale bar 10 xm) b patterned molecular printboards fabricated by supramolecular dip-pen nanolithography (DPN) (reprinted with permission from [92] Copyright 2004. WUey VCH) e locally hydrolyzed tert-butyl acrylate-terminated polymer film on oxidized silicon (soft lithography scale bar 3 xm) (Feng CL, Vancso GJ, SchOn-herr H, manuscript submitted to Langmuir) d photopatterned bilayer of diacetylene lipid (scale bar 10 xm). Reprinted in part with permission from [93], copyright (1999), American Chemical Society... Fig. 2 Atomic force microscopy (AFM) friction images and schematic illustrations of the patterning processes of a microcontact printed SAMs (mercaptoethanol dots in oc-tadecanethiol matrix, scale bar 10 xm) b patterned molecular printboards fabricated by supramolecular dip-pen nanolithography (DPN) (reprinted with permission from [92] Copyright 2004. WUey VCH) e locally hydrolyzed tert-butyl acrylate-terminated polymer film on oxidized silicon (soft lithography scale bar 3 xm) (Feng CL, Vancso GJ, SchOn-herr H, manuscript submitted to Langmuir) d photopatterned bilayer of diacetylene lipid (scale bar 10 xm). Reprinted in part with permission from [93], copyright (1999), American Chemical Society...
Atomic force microscopy (AFM) is a very useful technique to study the patterns exhibited at the surface of thin films. Used in taping mode, which exploits the interaction of the tip with the surface during intermittent contacts between... [Pg.87]

Figure 2. Atomic force microscopy topography image of the free surface of a microimprinted SP/PEMA-co-PMA film containing 5 wt% SP. The period of the pattern is 1.3 pm and its depth 520 nm. Figure 2. Atomic force microscopy topography image of the free surface of a microimprinted SP/PEMA-co-PMA film containing 5 wt% SP. The period of the pattern is 1.3 pm and its depth 520 nm.
Figure 6.15 Atomic force microscopy images of gold patterns prepared from micro- and nanopattemed poly(styrene-b-2-vinyl pyridine) (PS-b-P2VP) (a), PS-b-P2VP/poly(methyl methacrylate) (PMMA) thin films with PMMA composition of 10wt% (b), 20 wt% (c),... Figure 6.15 Atomic force microscopy images of gold patterns prepared from micro- and nanopattemed poly(styrene-b-2-vinyl pyridine) (PS-b-P2VP) (a), PS-b-P2VP/poly(methyl methacrylate) (PMMA) thin films with PMMA composition of 10wt% (b), 20 wt% (c),...
Figure 3.8 A sequential change, taken by atomic force microscopy, of a AS2S3 film (2.3 pm thick] exposed to focused ( 5 pm] linearly (horizontally] polarized laser light with photon energy and intensity of 2.3 eV and 0.1 mW (Tanaka and Asao, 2006, copyright permission from the Japan Society of Applied Physics], (a] Isotropic volume expansion at an exposure time of 0.5 min, (b] anisotropic M-shaped (cross-sectional] deformation at 30 min, and (c] chaotic pattern at 25 hr. Figure 3.8 A sequential change, taken by atomic force microscopy, of a AS2S3 film (2.3 pm thick] exposed to focused ( 5 pm] linearly (horizontally] polarized laser light with photon energy and intensity of 2.3 eV and 0.1 mW (Tanaka and Asao, 2006, copyright permission from the Japan Society of Applied Physics], (a] Isotropic volume expansion at an exposure time of 0.5 min, (b] anisotropic M-shaped (cross-sectional] deformation at 30 min, and (c] chaotic pattern at 25 hr.

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See also in sourсe #XX -- [ Pg.109 , Pg.110 ]




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