Aliphatic diol 4,5-disulfonate

Air-sandwich structure, 340 Aldehyde reactions, 168 Aliphatic diol 4,5-disulfonate structure, 125/... 

Aliphatic diol 4,5-disulfonate-based resist adjustment for generation of square-wave relief pattern, 127 application, 127 bleaching properties, 126/ development rate function, 130/ print quality, 127/ spectra of unexposed and bleached materials, 126/... 

Willson et al. (30) and Miller et al. (31) described a new mid-UV resist based on diazonaphthoquinone and a novolac resin speciScally designed for use in the mid-UV region. The novolac resin was chosen to be transparent above 300 nm. The structure of the naphthoquinone was designed with the aid of semiempirical molecular orbital calculations to provide increased optical absorbance at the 313-nm emission line. They found that 5-alkylsulfo-nates of diazonaphthoquinone exhibit a greatly improved extinction at both 313 and 334 nm over their aryl counterparts. Furthermore, these compounds photolyze to give substituted indenecarboxylic acids that are transparent above 300 nm, whereas the photoproducts of all of the corresponding aryl derivatives studied retain residual absorbance at 313 nm. They chose a mixed 4,5-disulfonate of an aliphatic diol (structure 3.4) as a spectrally matched sensitizer for the mid-UV resist. 

Figure 7. Unexposed and bleached spectra of experimental resist formulated from the 4,5-disulfonate of an aliphatic diol. (Reproduced with permission from Ref. 16.)...

Later, the same protocol was applied to the polycondensation of aliphatic diols of isosorbide with 1,8-dimesyloctane and other dibromo- and disulfonated alkylating agents... 

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