Big Chemical Encyclopedia

Chemical substances, components, reactions, process design ...

Articles Figures Tables About

Additional base component effect acid diffusion

Photoacid diffusion behavior in t-BOC-blocked chemically amplified positive DUV resists under various conditions was studied. Based on the experimental results, it was confirmed that only one mechanism dominated the acid diffusion in the resist film, and two diffusion paths, i.e., the remaining solvent in the resist film and hydrophilic OH sites of base phenolic resin, existed. Moreover, the effects of molecular weight dispersion, acid structure, and additional base component on both acid-diffusion behavior and lithographic performance were revealed. Finally, the acid diffusion behavior in the resist film was clarified and the acid diffusion length that affected the resist performance could be controlled. [Pg.124]


See other pages where Additional base component effect acid diffusion is mentioned: [Pg.110]    [Pg.121]    [Pg.409]    [Pg.38]    [Pg.46]    [Pg.18]    [Pg.729]    [Pg.759]    [Pg.231]    [Pg.493]    [Pg.364]    [Pg.20]    [Pg.376]   
See also in sourсe #XX -- [ Pg.121 , Pg.122 , Pg.123 ]




SEARCH



Acid additive effects

Acid diffusion

Acid diffusion effect

Acid-base component

Additional base component effect

Base component

Base effect

Bases base effect

Component addition

Diffusion effective

Diffusion effects diffusivity

Effective diffusivities

Effective diffusivity

© 2024 chempedia.info